UNSW has developed new dielectric patterning techniques to replace 
photolithography. Less steps, less and cheaper chemicals for manufacturing high 
efficiency solar cells.
The Technology
UNSW holds the world record for the efficiency of single junction silicon 
solar cell. The record of 25.0% was achieved using photolithography, which is 
too expensive for large scale commercial implementation.
The UNSW patterning techniques, which use inkjet printing or aerosol jet 
printing, are cheaper than photolithography. They avoid the use of expensive 
masks and mask aligners.
Digital images represent the etching patterns, so they are easily prepared 
and changed. The etching pattern is printed to form openings in a dielectric 
layer of silicon dioxide or PECVD silicon nitride.
The ‘resist’ technique typically etches grooves of 45 μm width, and holes ~40 
μm in diameter. A single resist layer can be used for multiple patterning 
processes.
How it works:
  - A resist layer is formed over the dielectric surface. 
  
 - Patterned deposition of a plasticizer forms   permeable regions 
  in the resist layer. 
  
 - Aqueous etchants then permeate through the patterned resist areas, and 
  etch openings in the dielectric layer.
 

Process of patented ‘resist’ technique
 
The ‘direct’ technique, requires fewer steps and uses less and cheaper 
chemicals than photolithography.
How it works:
1. An acidic polymer layer is formed over the dielectric surface.
2. A pattern of non-corrosive fluoride ions is deposited onto the 
polymer
3. The fluoride ions react with the polymer to form      
hydrogen fluoride (HF) locally, which then etches the underlying dielectric 
layer.
Key Benefits
  - Grooves narrow as 25 μm etched in a 75 nm thick PECVD silicon nitride 
  layer using an aerosol jet printer 
  
 - Immersion etching step is not needed so therefore largely reduced 
  quantities of toxic and corrosive etching fluid. 
  
 - Etched regions can be metal plated to form front metal contacts to the 
  solar cell. 
  
 - Significant OH&S advantages by reducing operator training expenses and 
  waste disposal issues. 
  
 - Other uses such as enhanced light capture into the cell by texturing the 
  silicon surface with dielectric masks created using UNSW’s dielectric 
  patterning techniques.
 
Opportunity
Collaborative partnership with UNSW to introduce production of high 
efficiency solar cells for large scale commercial production.
More Information and Contact Details: PDF 
verison of Non-Confidential Disclosure Document